Fluid treatment system

ABSTRACT

A fluid treatment system having: an inlet; an outlet; and a fluid treatment zone disposed therebetween. The fluid treatment zone has: (i) an elongate first radiation source assembly having a first longitudinal axis, and (ii) an elongate second radiation source assembly having a second longitudinal axis. The first and second longitudinal axes are non-parallel to each other and to a direction of fluid flow through the treatment zone. The present fluid treatment system can treat large volumes of fluid (e.g., wastewater, drinking water or the like); it requires a relatively small &#34;footprint&#34;; it results in a relatively lower coefficient of drag resulting in an improved hydraulic pressure loss/gradient over the length of the treatment system; and it results in relatively lower (or no) forced oscillation of the radiation sources thereby mitigating breakage of the radiation source and/or protective sleeve (if present).

CROSS-REFERENCE TO RELATED APPLICATION

This application is a continuation of U.S. patent application Ser. No.12/185,425, filed Aug. 4, 2008, now U.S. Pat. No. 8,148,699, issued Apr.3, 2012, which is a continuation of U.S. patent application Ser. No.11/078,706, filed Mar. 14, 2005, now U.S. Pat. No. 7,408,174, issuedAug. 5, 2008, which claims the benefit under 35 U.S.C. §119(e) ofprovisional patent application Ser. No. 60/552,185 filed on Mar. 12,2004 and Ser. No. 60/613,215 filed on Sep. 28, 2004, the contents ofeach of which are hereby incorporated by reference.

BACKGROUND OF THE INVENTION

1. Field of the Invention

In one of its aspects, the present invention relates to a fluidtreatment system, more particularly, an ultraviolet radiation watertreatment system. In another of its aspects, the present inventionrelates to a method for treating a fluid, more particularly a method forirradiating water.

2. Description of the Prior Art

Fluid treatment systems are generally known in the art. Moreparticularly, ultraviolet (UV) radiation fluid treatment systems aregenerally known in the art. Early treatment systems comprised a fullyenclosed chamber design containing one or more radiation (preferably UV)lamps. Certain problems existed with these earlier designs. Theseproblems were manifested particularly when applied to large open flowtreatment systems which are typical of larger scale municipal wastewater or potable water treatment plants. Thus, these types of reactorshad associated with them the following problems:

relatively high capital cost of reactor;

difficult accessibility to submerged reactor and/or wetted equipment(lamps, sleeve cleaners, etc);

difficulties associated with removal of fouling materials from fluidtreatment equipment;

relatively low fluid disinfection efficiency, and/or

full redundancy of equipment was required for maintenance of wettedcomponents (sleeves, lamps and the like).

The shortcomings in conventional closed reactors led to the developmentof the so-called “open channel” reactors.

For example, U.S. Pat. Nos. 4,482,809, 4,872,980 and 5,006,244 (all inthe name of Maarschalkerweerd and all assigned to the assignee of thepresent invention and hereinafter referred to as the Maarschalkerweerd#1 Patents) all describe gravity fed fluid treatment systems whichemploy ultraviolet (UV) radiation.

Such systems include an array of UV lamp modules (e.g., frames) whichinclude several UV lamps each of which are mounted within sleeves whichextend between and are supported by a pair of legs which are attached toa cross-piece. The so-supported sleeves (containing the UV lamps) areimmersed into a fluid to be treated which is then irradiated asrequired. The amount of radiation to which the fluid is exposed isdetermined by the proximity of the fluid to the lamps, the outputwattage of the lamps and the flow rate of the fluid past the lamps.Typically, one or more UV sensors may be employed to monitor the UVoutput of the lamps and the fluid level is typically controlled, to someextent, downstream of the treatment device by means of level gates orthe like.

The Maarschalkerweerd #1 Patents teach fluid treatment systems whichwere characterized by improved ability to extract the equipment from awetted or submerged state without the need for full equipmentredundancy. These designs compartmentalized the lamp arrays into rowsand/or columns and were characterized by having the top of the reactoropen to provide free-surface flow of fluid in a “top open” channel.

The fluid treatment system taught in the Maarschalkerweerd #1 Patents ischaracterized by having a free-surface flow of fluid (typically the topfluid surface was not purposely controlled or constrained). Thus, thesystems would typically follow the behavior of open channel hydraulics.Since the design of the system inherently comprised a free-surface flowof fluid, there were constraints on the maximum flow each lamp or lamparray could handle before either one or other hydraulically adjoinedarrays would be adversely affected by changes in water elevation. Athigher flows or significant changes in the flow, the unrestrained orfree-surface flow of fluid would be allowed to change the treatmentvolume and cross-sectional shape of the fluid flow, thereby renderingthe reactor relatively ineffective. Provided that the power to each lampin the array was relatively low, the subsequent fluid flow per lampwould be relatively low. The concept of a fully open channel fluidtreatment system would suffice in these lower lamp power andsubsequently lower hydraulically loaded treatment systems. The problemhere was that, with less powerful lamps, a relatively large number oflamps was required to treat the same volume of fluid flow. Thus, theinherent cost of the system would be unduly large and/or not competitivewith the additional features of automatic lamp sleeve cleaning and largefluid volume treatment systems.

This led to the so-called “semi-enclosed” fluid treatment systems.

U.S. Pat. Nos. 5,418,370, 5,539,210 and Re36,896 (all in the name ofMaarschalkerweerd and all assigned to the assignee of the presentinvention and hereinafter referred to as the Maarschalkerweerd #2patents) all describe an improved radiation source module for use ingravity fed fluid treatment systems which employ UV radiation.Generally, the improved radiation source module comprises a radiationsource assembly (typically comprising a radiation source and aprotective (e.g., quartz) sleeve) sealingly cantilevered from a supportmember. The support member may further comprise appropriate means tosecure the radiation source module in the gravity fed fluid treatmentsystem.

Thus, in order to address the problem of having a large number of lampsand the incremental high cost of cleaning associated with each lamp,higher output lamps were applied for UV fluid treatment. The result wasthat the number of lamps and subsequent length of each lamp wasdramatically reduced. This led to commercial affordability of automaticlamp sleeve cleaning equipment, reduced space requirements for thetreatment system and other benefits. In order to use the more powerfullamps (e.g. medium pressure UV lamps), the hydraulic loading per lampduring use of the system would be increased to an extent that thetreatment volume/cross-sectional area of the fluid in the reactor wouldsignificantly change if the reactor surface was not confined on allsurfaces, and hence such a system would be rendered relativelyineffective. Thus, the Maarschalkerweerd #2 patents are characterized byhaving a closed surface confining the fluid being treated in thetreatment area of the reactor. This closed treatment system had openends which, in effect, were disposed in an open channel. The submergedor wetted equipment (UV lamps, cleaners and the like) could be extractedusing pivoted hinges, sliders and various other devices allowing removalof equipment from the semi-enclosed reactor to the free surfaces.

The fluid treatment system described in the Maarschalkerweerd #2 patentswas typically characterized by relatively short length lamps which werecantilevered to a substantially vertical support arm (i.e., the lampswere supported at one end only). This allowed for pivoting or otherextraction of the lamp from the semi-enclosed reactor. Thesesignificantly shorter and more powerful lamps inherently arecharacterized by being less efficient in converting electrical energy toUV energy. The cost associated with the equipment necessary tophysically access and support these lamps was significant.

Historically, the fluid treatment modules and systems described in theMaarschalkerweerd #1 and #2 patents have found widespread application inthe field of municipal waste water treatment (i.e., treatment of waterthat is discharged to a river, pond, lake or other such receivingstream).

In the field of municipal drinking water, it is known to utilizeso-called “closed” fluid treatment systems or “pressurized” fluidtreatment systems.

Closed fluid treatment devices are known—see, for example, U.S. Pat. No.5,504,335 (Maarschalkerweerd #3). Maarschalkerweerd #3 teaches a closedfluid treatment device comprising a housing for receiving a flow offluid. The housing comprises a fluid inlet, a fluid outlet, a fluidtreatment zone disposed between the fluid inlet and the fluid outlet,and at least one radiation source module disposed in the fluid treatmentzone. The fluid inlet, the fluid outlet and the fluid treatment zone arein a collinear relationship with respect to one another. The at leastone radiation source module comprises a radiation source sealablyconnected to a leg which is sealably mounted to the housing. Theradiation source is disposed substantially parallel to the flow offluid. The radiation source module is removable through an apertureprovided in the housing intermediate to fluid inlet and the fluid outletthereby obviating the need to physically remove the device for serviceof the radiation source.

U.S. Pat. No. 6,500,346 [Taghipour et al. (Taghipour)] also teaches aclosed fluid treatment device, particularly useful for ultravioletradiation treatment of fluids such as water. The device comprises ahousing for receiving a flow of fluid. The housing has a fluid inlet, afluid outlet, a fluid treatment zone disposed between the fluid inletand the fluid outlet and at least one radiation source having alongitudinal axis disposed in the fluid treatment zone substantiallytransverse to a direction of the flow of fluid through the housing. Thefluid inlet, the fluid outlet and the fluid treatment zone are arrangedsubstantially collinearly with respect to one another. The fluid inlethas a first opening having: (i) a cross-sectional area less than across-sectional area of the fluid treatment zone, and (ii) a largestdiameter substantially parallel to the longitudinal axis of the at leastone radiation source assembly.

Practical implementation of known fluid treatment systems of the typedescribed above have been such that the longitudinal axis of theradiation source is: (i) parallel to the direction of fluid flow throughthe fluid treatment system, or (ii) orthogonal to the direction of fluidflow through the fluid treatment system. Further, in arrangement (ii),it has been common to place the lamps in an array such that, from anupstream end to a downstream end of the fluid treatment system, adownstream radiation source is placed directly behind an upstreamradiation source.

The use of arrangement (ii) in an UV radiation water treatment systemhas been based on the theory that radiation was effective up to aprescribed distance from the radiation source, depending on thetransmittance of the water being treated. Thus, it has becomecommonplace to interspace the radiation sources in arrangement (ii) suchthat the longitudinal axes of adjacent radiation sources are spaced at adistance equal to approximately twice the prescribed distance mentionedin the previous sentence.

Unfortunately, for the treatment of large volumes of fluid, arrangement(ii) can be disadvantageous for a number of reasons. Specifically,implementation of arrangement (ii) requires a relatively large“footprint” or space to house the radiation sources. Further, the use ofa large number of radiation sources in arrangement (ii) creates arelatively large coefficient of drag resulting in a relatively largehydraulic pressure loss/gradient over the length of the fluid treatmentsystem. Still further, the use of a large number of radiation sources inarrangement (ii) can produce vortex effects (these effects are discussedin more detail hereinbelow) resulting in forced oscillation of theradiation sources—such forced oscillation increases the likelihood ofbreakage of the radiation source and/or protective sleeve (if present).

Accordingly, there remains a need in the art for a fluid treatmentsystem, particularly a closed fluid treatment system which has one ormore of the following features:

it can treat large volumes of fluid (e.g., wastewater or drinking waterand the like);

it can increase the limit of the maximum admissible velocity through thereactor;

it requires a relatively small “footprint”;

it results in a relatively lower coefficient of drag resulting in animproved hydraulic pressure loss/gradient over the length of the fluidtreatment system;

it results in relatively lower (or no) forced oscillation of theradiation sources thereby obviating or mitigating breakage of theradiation source and/or protective sleeve (if present);

it can be readily adapted to make use of relatively recently developedso-called “low pressure high output” (LPHO), amalgam and/or other UVemitting lamps while allowing for ready extraction of the lamps from thefluid treatment system for servicing and the like;

it can employ a lamp of a standard length for varying widths ofreactors;

it can be readily combined with a cleaning system for removing foulingmaterials from the exterior of the radiation source(s);

it can be readily installed in a retrofit manner in an existing fluidtreatment plant; and

it provides relatively improved disinfection performance compared toconventional fluid treatment systems.

SUMMARY OF THE INVENTION

It is an object of the present invention to provide a novel fluidtreatment system which obviates or mitigates at least one of theabove-mentioned disadvantages of the prior art.

In one of its aspects, the present invention relates to a fluidtreatment system comprising:

an inlet;

an outlet;

a fluid treatment zone disposed between the inlet and the outlet, thefluid treatment zone having disposed therein: (i) an elongate firstradiation source assembly having a first longitudinal axis, and (ii) anelongate second radiation source assembly having a second longitudinalaxis;

wherein the first longitudinal axis and the second longitudinal axis arenon-parallel to each other and to a direction of fluid flow through thefluid treatment zone.

In another of its aspects, the present invention relates to a fluidtreatment system comprising:

an inlet;

an outlet;

a fluid treatment zone disposed between the inlet and the outlet, thefluid treatment zone having disposed therein an array of radiationsource assemblies arranged serially from an upstream region to adownstream region of fluid treatment zone such that: (i) each radiationsource assembly has a longitudinal axis transverse to a direction offluid flow through the fluid treatment zone, (ii) the longitudinal axisof an upstream radiation source assembly is staggered with respect to adownstream radiation source assembly in a direction orthogonal to thedirection of fluid flow through the fluid treatment zone to define apartial overlap between the upstream radiation source assembly and thedownstream radiation source assembly, and (iii) a flow of fluid has nounobstructed path through the fluid treatment zone.

In another of its aspects, the present invention relates to a fluidtreatment system comprising:

an inlet;

an outlet;

a fluid treatment zone disposed between the inlet and the outlet, thefluid treatment zone having disposed therein an array of rows ofradiation source assemblies;

each radiation source assembly having a longitudinal axis transverse orparallel to a direction of fluid flow through the fluid treatment zone;

each row comprising a plurality of radiation source assemblies in spacedrelation in a direction transverse to the direction of fluid flowthrough the fluid treatment zone to define a gap through which fluid mayflow between an adjacent pair of radiation source assemblies;

all rows in the array being staggered with respect to one another in adirection orthogonal to the direction of fluid flow through the fluidtreatment zone such that the gap between an adjacent pair of radiationsource assemblies in an upstream row of radiation source assemblies ispartially or completely obstructed in the direction of fluid flow by atleast two serially disposed downstream rows of radiation sourceassemblies.

In yet another of its aspects, the present invention relates to a fluidtreatment system comprising:

an inlet;

an outlet;

a fluid treatment zone disposed between the inlet and the outlet, thefluid treatment zone having disposed therein an array of radiationsource assemblies, each radiation source assembly having a longitudinalaxis transverse to a direction of fluid flow through the fluid treatmentzone;

the array of radiation source assemblies comprising: a first row ofradiation source assemblies, a second row of radiation source assembliesdownstream from the first row of radiation source assemblies, a thirdrow of radiation source assemblies downstream from the second row ofradiation source assemblies and a fourth row of radiation sourceassemblies downstream from the third row of radiation source assemblies;

an adjacent pair of radiation source assemblies in the first rowdefining a first gap through which fluid may flow, a radiation sourceassembly from the second row partially obstructing the first gap todivide the first gap into a second gap and a third gap, a radiationsource assembly from the third row at least partially obstructing thesecond gap and a radiation source assembly from the fourth row at leastpartially obstructing the third gap.

In yet another of its aspects, the present invention relates to a fluidtreatment system comprising:

an inlet;

an outlet;

a fluid treatment zone disposed between the inlet and the outlet, thefluid treatment zone having disposed therein an array comprising 4 rowsradiation source assemblies arranged serially from an upstream portionto a downstream portion of the fluid treatment zone;

each radiation source assembly having a longitudinal axis transverse toa direction of fluid flow through the fluid treatment zone;

wherein: (i) a first pair of rows of radiation source assemblies in thearray comprise substantially uniform spacing between adjacent pairs ofradiation source assemblies in the row; and (ii) a second pair of rowsof radiation source assemblies in the array comprise substantiallynon-uniform spacing between adjacent pairs of radiation sourceassemblies in the row.

In addition to the arrayed arrangement of radiation source assembliesdescribed above, it is possible to utilize so-called boundary radiationsource assemblies—i.e., radiation source assemblies placed in paralleland in close proximity to the opposed reactor walls. All axes of theboundary radiation source assemblies adjacent to one another, either ofthe respective outer boundary radiation source assemblies are in thesame plane.

Thus, the present inventors have discovered a fluid treatment systemhaving one or more of the following advantages:

it can treat large volumes of fluid (e.g., wastewater, drinking water orthe like);

it can increase the limit of the maximum admissible velocity through thereactor;

it requires a relatively small “footprint”;

it results in a relatively lower coefficient of drag resulting in animproved hydraulic pressure loss/gradient over the length of the fluidtreatment system;

it results in relatively lower (or no) forced oscillation of theradiation sources thereby obviating or mitigating of breakage of theradiation source and/or protective sleeve (if present);

it can be readily adapted to make use of low pressure ultravioletemitting lamps and relatively recently developed so-called “low pressurehigh output” (LPHO), amalgam and/or other ultraviolet radiation andphoton emitting lamps while allowing for ready extraction of the lampsfrom the fluid treatment system for servicing and the like;

it can employ a lamp of standard length for varying widths of reactorssimply by varying the transverse angle between the lamps;

it can be readily combined with a cleaning system for removing foulingmaterials from the exterior of the radiation source(s);

it can be readily installed in a retrofit manner in an existing fluidtreatment plant; and

it provides relatively improved disinfection performance compared toconventional fluid treatment systems (e.g., systems in which theradiation source is disposed such that its longitudinal axis is parallelor orthogonal to the direction of fluid flow through the fluid treatmentzone contained within the system).

In one of its general aspects, the present invention relates to a fluidtreatment system comprising at least two radiation source assembliesarranged in a novel manner. Specifically, the radiation sourceassemblies are arranged such that the respective longitudinal axes ofthe radiation sources therein are in a non-parallel relationship witheach other and with respect to the direction of fluid flow through thefluid treatment zone. This is different than conventional fluidtreatment systems wherein all lamps are arranged such that thelongitudinal axes of the respective radiation sources within theradiation source assemblies are in a parallel relationship and theseaxes are orthogonal or parallel to the direction of fluid flow.

In a particularly preferred embodiment of this aspect of the invention,the radiation source assemblies are arranged in an array which isgenerally V-shaped. In this embodiment, it is preferred to haverespective banks of radiation source assemblies which are stacked toform the V-shaped arrangement. As will be discussed in more detailbelow, one of the advantages of orienting the radiation sourceassemblies in this matter is a significant reduction in forcedoscillation of the radiation sources due to vortex effects.

In another of its aspects, the present invention relates to a fluidtreatment system wherein the radiation source assemblies are arrangedtransverse or parallel to the direction of fluid flow through the fluidtreatment zone as a series of rows, each row comprising a plurality ofradiation sources assemblies spaced apart in a direction orthogonal tothe direction of fluid flow through the fluid treatment zone. In oneembodiment of this aspect of the invention (also referred to as the“staggered/transverse orientation”), the radiation source assemblies arearranged transverse to the direction of fluid flow through the fluidtreatment zone and oriented in a manner whereby, from an upstreamportion to a downstream portion of the fluid treatment zone, theradiation source assemblies are staggered in a direction orthogonal to adirection of fluid flow through the fluid treatment zone to definepartial overlap between these assemblies. Preferably, the collection ofassemblies is arranged such that a flow of fluid has no unobstructedpath through the arrangement of radiation source assemblies in the fluidtreatment zone. Practically, one may envision this by viewing the inletof the fluid treatment zone and seeing no clear, unobstructed paththrough the arrangement of radiation source assemblies in the fluidtreatment zone from the inlet to the outlet. In another embodiment ofthis aspect of the invention (also referred to as the“staggered/parallel orientation”), the radiation source assemblies arearranged parallel to the direction of fluid flow through the arrangementof radiation source assemblies in the fluid treatment zone and orientedin a manner whereby, from an upstream portion to a downstream portion ofthe fluid treatment zone, the radiation source assemblies are arrangedas in the form of at least two serially disposed banks such that rows ofradiation source assemblies in an upstream bank are staggered withrespect to rows of radiation source assemblies in a downstream bank in adirection orthogonal to the direction of fluid flow through thearrangement of radiation source assemblies in the fluid treatment zone.

In another of its aspects, the present invention relates to a fluidtreatment system in which an array of radiation source assemblies arearranged in the fluid treatment zone. The radiation source assembliesare oriented transverse to the direction of fluid flow through the fluidtreatment zone. The array of radiation source assemblies includes afirst row of radiation source assemblies arranged to define apredetermined spacing between pairs of radiation source assemblies inthe row in a direction orthogonal to the direction of fluid flow throughthe fluid treatment zone. At least two further rows of radiation sourceassemblies are disposed downstream of the first row of radiation sourceassemblies. In one preferred embodiment, these downstream rows ofradiation source assemblies (i.e., two or more of such rows) combine tofill or occupy the pre-determined spacing between pairs of radiationsource assemblies within the column of lamps in the first row—i.e., ifone were to view the array of radiation source assemblies from the inletof the fluid treatment system. In another preferred embodiment, thesedownstream rows of radiation source assemblies (i.e., two or more ofsuch rows) combine only to partially fill or occupy the pre-determinedspacing between pairs of radiation source assemblies within the columnof lamps in the first row—i.e., if one were to view the array ofradiation source assemblies from the inlet of the fluid treatmentsystem.

In the present fluid treatment system, it is possible to incorporate aso-called transition region upstream and/or downstream of the fluidtreatment zone. Preferably, such a transition region serves to funnel orotherwise transition the flow of fluid in a manner such thatcross-sectional area of the flow of fluid orthogonal to the direction offluid flow is: (i) increased (if the transition region is placedupstream of the fluid treatment zone) thereby decreasing fluid flowvelocity, or (ii) decreased (if the transition region is placeddownstream of the fluid treatment zone) thereby increasing fluid flowvelocity.

Throughout the specification, reference is made to terms such as “closedzone”, “closed cross-section” and “constrained”. In essence, these termsare used interchangeably and are intended to encompass a structure whicheffectively surrounds the fluid flow in a manner similar to thatdescribed in the Maarschalkerweerd #2 patents (with particular referenceto the fluid treatment zone described therein).

Further, as used throughout this specification, the term “fluid” isintended to have a broad meaning and encompasses liquids and gases. Thepreferred fluid for treatment with the present system is a liquid,preferably water (e.g., wastewater, industrial effluent, reuse water,potable water, ground water and the like). Still further, the terms“rows” and “columns” are used throughout this specification in relationto arrangements of radiation sources and it is to be understood thatthese terms are used interchangeably.

Those with skill in the art will recognize that there is referencethroughout the specification to the use of seals and the like to providea practical fluid seal between adjacent elements in the fluid treatmentsystem. For example, those of skill in the art will recognize that it iswell known in the art to use combinations of coupling nuts, O-rings,bushings and like to provide a substantially fluid tight seal betweenthe exterior of a radiation source assembly (e.g., water) and theinterior of a radiation source assembly containing the radiation source(e.g., an ultraviolet radiation lamp).

BRIEF DESCRIPTION OF THE DRAWINGS

Embodiments of the present invention will be described with reference tothe accompanying drawings, wherein like numerals designate likeelements, and in which:

FIG. 1 illustrates, in perspective view, partially cutaway, a schematicof a first embodiment of the present fluid treatment system;

FIG. 2 illustrates a perspective view, partially cutaway of a secondembodiment of the present fluid treatment system;

FIG. 3 illustrates an end view from the inlet of the fluid treatmentsystem illustrated in FIG. 2;

FIG. 4 illustrates a top view (partially cutaway) of the fluid treatmentsystem illustrated in FIG. 2;

FIG. 5 illustrates a side elevation of the fluid treatment systemillustrated in FIG. 2;

FIG. 6 illustrates a schematic side elevation of orientation ofradiation source assemblies in a third embodiment of the present fluidtreatment system;

FIG. 7 illustrates a schematic side elevation of orientation ofradiation source assemblies in a fourth embodiment of the present fluidtreatment system;

FIG. 8 a illustrates a top view (partially cutaway) of a fifthembodiment of the present fluid treatment system;

FIG. 8 b illustrates a top view (partially cutaway) of a sixthembodiment of the present fluid treatment system;

FIG. 9 illustrates a top view of an array of radiation source assembliesincorporating a cleaning device for removing fouling materials from theexterior of the assemblies;

FIG. 10 illustrates vortices generated as fluid flows passes a radiationsource assembly of a prior art fluid treatment system;

FIG. 11 illustrates vortices generated as fluid flows passes a radiationsource assembly of a fluid treatment system in accordance with thepresent invention;

FIGS. 12-15, there is illustrated schematic end views (i.e., viewedthrough the fluid treatment zone) of a number of embodiments of thestaggered/parallel orientation referred to above; and

FIG. 16 illustrates a schematic side elevation of orientation ofradiation source assemblies in a highly preferred embodiment of thepresent fluid treatment system.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

With reference to FIG. 1, there is illustrated a fluid treatment system10. Fluid treatment system 10 comprises an inlet 12 and an outlet 24.Disposed between inlet 12 and outlet 24 is a fluid treatment zone 20.

Fluid treatment zone 20 is interconnected to inlet 12 by an inlettransition zone 14 comprising a first transition region 16 andintermediate transition region 18. Outlet 24 is interconnected to fluidtreatment zone 20 by an outlet transition zone 22.

As illustrated, fluid passes through fluid treatment system 10(including fluid treatment zone 20) in the direction of arrow A.

As shown, each of inlet 12, inlet transition zone 14, fluid treatmentzone 20, outlet transition zone 22 and outlet 24 have a closedcross-section. The use of the term “closed cross-section” is intended tomean an enclosure which bounds a flow of fluid on all sides and/orsurfaces.

As shown, inlet 12 and outlet 24 have a circular cross-section much likea conventional pipe arrangement. As further illustrated, fluid treatmentzone 20 has a square or rectangular cross-section. Of course it ispossible to configure fluid treatment zone 20 to have othercross-sectional shapes.

Disposed in fluid treatment zone 20 is a first bank 26 of radiationsource assemblies and a second bank 28 of radiation source assemblies.Each radiation source assembly in banks 26 and 28 is elongate and has alongitudinal axis which is angled with respect to the direction of fluidflow (see arrow A or dashed lined 30 which is a projection of arrow A)through fluid treatment zone 20.

The radiation source assemblies in bank 26 are mounted on one side offluid treatment zone 20 and have a distal end thereof supported by asupport element 32. Similarly, each radiation source assembly in bank 28has one end mounted on a side of fluid treatment zone 20 and a distalend thereof supported by support element 32.

In the result, the array of radiation source assemblies presented bybanks 26 and 28 to the flow of fluid is in the form of an V-shapedconfiguration with the apex of the “V” being pointed toward the flow offluid. Of course, the apex of the “V” could be pointed in the oppositedirection.

Further, while the distal end of each radiation source assembly in banks26 and 28 is supported by a single support element 32, other supportelements will be apparent of those of skill in the art.

As shown, intermediate transition region 18 serves the purpose ofproviding a nesting region for the apex of the array of lamps. As such,it is preferred to have the sides of intermediate transition region 18tapered to a smaller dimension while, in the illustrated embodiment,maintaining the top and bottom at a consistent dimension (this will bediscussed further below).

First transition region 16 interconnects intermediate transition region18 and inlet 12, and serves the purpose of: (i) reducing the dimensionof the enclosure, and (ii) transitioning the cross-section shape from apolygon to a circle. Similarly, outlet transition zone 22 serves toreduce the dimension of the enclosure and transition the cross-sectionalshape of the enclosure from a circle to a polygon.

The use of inlet transition zone 14 and outlet transition zone 22 alsoserves to obviate or mitigate hydraulic head loss problems that mightoccur if dramatic changes in dimensions of the enclosure were cast intothe system.

A second embodiment of the present fluid treatment system will now bediscussed with reference to FIGS. 2-5. In FIGS. 2-5, elements having thesame last two digits as elements appearing in FIG. 1 are attended todenote like elements.

With reference to FIGS. 2-5, there is illustrated a fluid treatmentsystem 100. Fluid treatment system 100 comprises an inlet 112 and anoutlet 124. Fluid treatment system 100 further comprises a fluidtreatment zone 120.

Inlet 112 is interconnected to fluid treatment zone 120 by an inlettransition zone 114. Fluid outlet 124 is interconnected to fluidtreatment zone 120 by an outlet transition zone 122. Inlet transitionzone 114 comprises a first transition region 116 and an intermediatetransition region 118.

Disposed in fluid treatment zone 120 is a first bank 126 of radiationsource assemblies and a second bank 128 of radiation source assemblies.The orientation of the radiation source assemblies in banks 126 and 128with respect to the direction of fluid flow through fluid treatment zone120 is similar as that described above with respect to FIG. 1.

As shown, the distal portion of each radiation source assembly in banks126 and 128 is supported by a support post which is disposed transverseto: (i) the direction of fluid flow through fluid treatment zone 120,and (ii) the longitudinal axis of each radiation source assembly.

As shown, particularly with respect to FIG. 4, a support post 134 isused for each column of radiation source assemblies in banks 126 and128. As further illustrated FIG. 4, the upstream end of the array ofradiation sources comprises a column of radiation source assemblies frombank 126 connected to a support post 134—i.e., there is no similarcolumn of radiation source assemblies from bank 128 supported by theupstream centre support. This arrangement is reversed at a downstreamsupport post 134 a. Otherwise, each centre post serves the purpose ofsupporting a distal portion of radiation source assemblies from onecolumn of each of banks 126 and 128. In some cases support post 134 alsoacts as a baffle, and likely will act as a protective shield behindwhich will be parked a cleaning device (described below).

With particular reference to FIGS. 2 and 5, it can be seen that mountingsleeves 136 are cast or otherwise secured to the exterior surface offluid treatment zone 120. The proximal region of each radiation sourceassembly is received in mounting sleeves 136 and a fluid type seal (notshown) can be achieved in a conventional manner.

As further illustrated in FIGS. 2-5, inlet 112 and outlet 124 can beadapted to have a suitable standard flange element 113 and 125,respectively. This facilitates insulation of fluid treatment system 100in conventional piping. For example, it is possible for flange elements113 and 125 to be configured for conventional piping sizes between, forexample, 12 inches and 72 inches.

With particular reference to FIG. 3, it will be seen that banks 126 and128 are arranged as an array of radiation source assemblies that presentan obstruction which completely fills fluid treatment zone 120 when thefluid treatment zone 120 is viewed through inlet 112. In other words,there is no apparent path by which fluid can pass through fluidtreatment zone 120 without being forced to detour around a radiationsource assembly in banks 126 and/or 128. This being the case, the axisof each radiation source assembly can be seen by an observer lookingalong the direction of fluid flow through fluid treatment zone 120.

This effect is created by partially staggering the orientation ofradiation source assemblies in banks 126 and 128. For example, withreference to FIG. 5, it can be seen that, proceeding lengthwise alongfluid treatment zone 120, there is partial overlap of an upstreamradiation source assembly with a downstream radiation source assembly ina successive manner—see, for example, lines 150 in FIG. 5 whichillustrate such a gradual staggering of radiation source assemblies ineach of banks 126 and 128. In other words, a downstream radiation sourceassembly is partially exposed and partially obscured by an adjacentupstream radiation source assembly. Thus, it can be seen that thecomplete obstruction of the cross-sectional area the section of fluidtreatment zone 120 (i.e., the section in which banks 126 and 128 aredisposed) discussed above is not achieved by staggering of twosuccessive columns of radiation source assemblies in banks 126 and 128such that a downstream radiation source assembly fills the space betweena pair of upstream radiation source assemblies. Rather, in thisembodiment, three or more columns of such radiation source assembliesare oriented, in combination, to achieve the complete obstruction.

Preferably, each radiation source assembly preferably comprises of anelongate radiation source (e.g. an ultraviolet radiation lamp such as alow pressure high output ultraviolet radiation lamp) disposed within aprotective sleeve (e.g. made from a radiation transparent material suchas quartz and the like). In some case it may be possible (and preferred)to utilize a radiation source without a protective sleeve (e.g., photonemitting lamps without a protective sleeve).

As can be seen, particularly with reference to FIG. 5, intermediateregion 118 of inlet transition zone 114 has a transverse direction thesame as fluid treatment zone 120. The sides of intermediate region 118of inlet transition zone 114 are tapered as shown in FIG. 4. Thisarrangement allows for the tapering transition on the one hand whileleaving adequate room for the apex of the array of radiation sources onthe other hand.

The radiation source assemblies in banks 126 and 128 have longitudinalaxes which are angled with respect to the direction of fluid flow (arrowA) through fluid treatment zone 120. The result is an apex-shapeorientation of radiation source assemblies in banks 126 and 128 asclearly seen in, for example, FIG. 4. The angle .alpha. between therespective longitudinal axes of radiation source assemblies in banks 126and 128 is preferably in the range of from about 15.degree. to about170.degree., more preferably from about 35.degree. to about 120.degree.,even more preferably from about 50.degree. to about 120.degree., mostpreferably from about 60.degree. to about 90.degree. It will beappreciated by those of skill in the art that, with a fixed lengthradiation source, the angle will determine the cross sectional area ofthe reactor. Further, although not illustrated specifically in thedrawings herein, it is preferred and desirable to incorporate in thepresent fluid treatment system a cleaning device for removing foulingmaterials from the exterior of the radiation source assemblies in banks126 and 128.

An example of incorporating a cleaning device in the present fluidtreatment system is illustrated schematically in FIG. 9. As shown, it ispossible to incorporate the cleaning device as a sleeve which travels ina reciprocal manner over the exterior of the radiation sourceassemblies. As shown, a cleaning device 28 is provided for eachradiation source assembly in the form of a movable sleeve. In theillustrated embodiment, cleaning device 28 is “parked” such that it isdownstream of support post 134. The nature of cleaning device 28 is notparticularly restricted. See, for example, U.S. Pat. No. 6,342,188[Pearcey et al.] and U.S. Pat. No. 6,646,269 [Traubenberg et al.], bothassigned to the assignee of the present invention.

With reference to FIG. 6, there is illustrated the side elevation, inschematic, of an arrangement of radiation source assemblies. Generally,this arrangement is the same as the V-shaped configuration discussedabove. As shown, there is a row B of 6 radiation source assembliesdisposed vertically in the fluid treatment zone. Between each pair ofradiation source assemblies in row B, there is a pre-determined spacingC.

As illustrated, radiation source assemblies downstream of row B arearranged in a manner whereby more than two subsequent downstreamvertical rows of radiation source assemblies are required to partiallyobscure pre-determined spacing C. In other words, if one were to viewthe array of radiation source assemblies along arrow D the flow of fluidthrough pre-determined spacing C would be obstructed as a result of thearrangement of at least two rows of radiation source assembliesdownstream of row B. It will be appreciated by those of skill in the artthat, with a relatively large enough number of rows B, the staggeredradiation source assemblies per row can completely obstruct the line ofvision through the staggered array whereas with fewer radiation sourceassemblies, the line of sight would not be completely obstructed.

As shown, the array of radiation source assemblies includes a quartet ofboundary lamps disposed in the same plain at the outer edges of thestaggered array, in this embodiment, of the fluid treatment zone. Asfurther illustrated, the array of radiation source assemblies isarranged to define repeating pattern consisting of a parallelogramcontaining four radiation source assemblies.

FIG. 7 illustrates a schematic similar to the one shown in FIG. 6 withthe exception that the staggering of the radiation source assemblies isdifferent from that shown in FIG. 6. Specifically, it will be seen thatthe parallelogram repeating pattern referred to above with reference toFIG. 6 does not appear in the arrangement shown in FIG. 7. Otherwise,FIG. 7 does illustrate the use of boundary lamps and the staggering ofsubsequent rows of radiation source assemblies such that the gap betweenpairs of radiation source assemblies in the first row is effectivelyfilled by more than two subsequent rows as one views the array ofradiation source assemblies from one end of the fluid treatment zone.

FIG. 8 a is a schematic similar to that shown in FIG. 4 with theexception that two arrays 120 a and 120 b are used in the fluidtreatment zone. As shown, each of array 120 a and array 120 b is aV-configuration similar to that shown in FIGS. 1-4 described above.

FIG. 8 b is a schematic similar to that shown in FIG. 4 with theexception that four arrays 120 a, 120 b, 120 c and 120 d are used in thefluid treatment zone. As shown, each of array 120 a, 120 b, 120 c and120 d is a V-configuration similar to that shown in FIGS. 1-4 describedabove. Preferably, each array 120 a, 120 b, 120 c and 120 d is arrangedas described below with reference to FIG. 16. In FIG. 8 b, it ispreferred that the spacing between adjacent arrays 120 a, 120 b, 120 cand 120 d is equal to the spacing between adjacent pairs lamps in acolumn of lamps in an array (e.g., dimension X in FIG. 16).

With reference to FIG. 10, there is shown, in schematic, a radiationsource assembly E which is disposed such that its longitudinal axes isorthogonal to the direction of fluid flow shown by arrow A—such anorientation is known from the prior art. As will be understood by thoseof skill in the art, this orientation of radiation source assembly Epresents a circular cross-section to the direction of fluid flow shownby arrow A. Consequently, vortices are generated downstream of radiationsource assembly E which are random and wide-angled. The result of thisis forced oscillation of radiation source assembly E and/or otherradiation source assemblies in the vicinity of radiation source assemblyE which can lead to breakage thereof.

With reference to FIG. 11, there is shown, in schematic, a radiationsource assembly F orientated in the manner described above withreference to FIGS. 1-4. In this orientation, radiation source assembly Fpresents an oval or ellipse cross-section to the direction of the flowof fluid depicted by arrow A. Consequently, vortices downstream ofradiation source assembly F are more regular and less likely to createthe forced oscillation disadvantages that can result in breakage of theradiation source assembly.

With reference to FIGS. 12-15, there is illustrated schematic end views(i.e., view thorough the fluid treatment zone) of a number ofembodiments of the staggered/parallel orientation referred to above. InFIGS. 12-15, reference is made to “First”, “Second” and “Third” (FIG.13-15) when describing a “Bank” of radiation source assemblies. Theseterms are intended to denote serial placement of a given “Bank” in adirection from an upstream portion to a downstream portion of the fluidtreatment zone.

Thus, with reference to FIG. 12, it will be seen that the rows ofradiation source assemblies in the “First Bank” are staggered in tworespects: (i) there is a stagger with respect to a downstream (orupstream) “Second Bank” of radiation source assembles, and (ii) there isa stagger between adjacent rows of radiation source assemblies in the“First Bank”. The arrangement of radiation source assemblies shown inFIG. 12 is particularly well suited for application in fluid treatmentsystems such as those described in the Maarshalkerweerd #2 patents.

With reference to FIG. 13, there is illustrated another schematicarrangement of radiation source assemblies in accordance with thestaggered/parallel orientation referred to above. The arrangement ofradiation source assemblies shown in FIG. 13 is particularly well suitedfor application in open channel fluid treatment systems such as thosedescribed in the Maarshalkerweerd #1 Patents. As shown, the arrangementof radiation source assemblies comprises a First Bank, a Second Bank anda Third Bank. It will be seen that, in an end view, for an adjacent trioof rows of radiation source assemblies in the First Bank, the SecondBank and the Third Bank, each of the First Bank and the Third Bank is:(i) staggered with respect to the Second Bank, and (ii) non-staggeredrespect to the other. The resulting orientation of radiation may becharacterized by: (i) an equilateral triangle though the axis ofradiation source assemblies in adjacent rows of the same Bank, and (ii)an equilateral triangle though the axis of radiation source assembliesin an adjacent trio rows of the First Bank, the Second Bank and theThird Bank.

With reference to FIGS. 14 and 15, there are illustrated schematic viewsof arrangements of radiation source assemblies similar to that discussedabove with reference to FIG. 13. In FIG. 13, from the left hand reactorwall, the positioning of rows is: First Bank followed by Second Bankfollowed by Third Bank. In FIG. 14, from the left hand reactor wall, thepositioning of rows is: Second Bank followed by Third Bank followed byFirst Bank. In FIG. 15, from the left hand reactor wall, the positioningof rows is: Second Bank followed by First Bank followed by Third Bank.

With reference to FIG. 16, there is illustrated a highly preferredarrangement of radiation source assemblies for use in the present fluidtreatment system. Thus, in FIG. 16, there is illustrated a schematicarrangement (e.g., specific details support, electrical connection andsealing of the radiation source assemblies has been omitted for clarity)of the radiation source assemblies shown in a side elevation of thefluid treatment system. Each oval in FIG. 16 denotes an opening in awall of the fluid treatment system through which an end of the radiationsoured assembly would emanate. It is preferred to arrange the radiationsource assemblies in a manner such as illustrated above with referenceto any of FIGS. 1-4, 8 a and 8 b.

With continued reference to FIG. 16, there is illustrated a fluidtreatment system 200 comprising, in a preferred embodiment, an enclosed(or closed) fluid treatment zone having a reactor ceiling 205 and areactor floor 240. Disposed between reactor ceiling 205 and reactorfloor 240 are four modules A, B, C and D of radiation source assemblies.Modules A, B. C and D are substantial the same. Those with skill in theart will appreciate that, while four modules are illustrated in FIG. 16,it is possible to use fewer or greater then four depending on the volumeof fluid being treated, the quality of fluid being treated and otherfactors within the purview of a person skilled in the art.

Each of modules A, B, C and D comprises four rows 210, 215, 220 and 225.As shown, rows 215 and 220 each comprise a series of radiation sourceassemblies where each adjacent pair of radiation source assemblies ineach row are spaced apart in a substantially uniform manner.Specifically, the distance between all adjacent pairs of radiationsource assemblies in row 215 is X as is the distance between alladjacent pairs of radiation source assemblies in row 220.

With reference to rows 210 and 225, it will be seen that most of thepairs of adjacent radiation source assemblies are equally spaced and, ina preferred embodiment, the spacing is X as shown with respect of rows215 and 220. However, rows 210 and 225 also contain a pair of radiationsource assemblies with a spacing Y that is less then spacing X usedelsewhere in rows 210 and 225.

As will be seen with reference to module A, a quartet of radiationsource assemblies including a single radiation source assembly from eachof rows 210, 215, 220 and 225 is arranged to define a parallelogramrepeating unit E. Parallelogram repeating unit E comprises all of theradiation source assemblies in module A except the pair of boundaryradiation source assemblies 230. Those with skill in the art willappreciate that it is possible to use parallelogram repeating pattern Eto scale up or scale down module A (or one or more modules B, C and D)depending on factors such as the volume of fluid being treated and thelike.

Another feature of module A is the so-called stagger order of theradiation source assemblies appearing in the parallelogram repeatingunit E. As shown, progressing from reactor ceiling 205 to reactor floor240, for a given parallelogram repeating pattern E, the following is theorder of rows from which the radiation source assembly is derived: 210,220, 215 and 225. In other words, for a given parallelogram repeatingunit E, the sequence of rows progressing from an upstream portion of thefluid treatment zone to a downstream portion of the fluid treatment zone(i.e., 210, 215, 220 and 225) differs from the sequence of rowsprogressing from reactor ceiling 205 to reactor floor 240 (i.e., 210,220, 215 and 225). This results in the parallelogram repeating unit Eand provides advantageous in the ability to efficiently treat fluidpassing through fluid treatment system 200.

Specifically, this so-called stagger order allows for scalability andmodulation of the power used to operate the fluid treatment system. Bythis it is meant that, using a stagger order such as parallelogramrepeating pattern E, it is possible to lower the power consumption oreven turn off of the power to certain rows of radiation sourceassemblies within a given module (e.g., one, some or all of modules A,B, C and D) to account for factors such as fluid transmittance, typeand/or concentration of a particular contaminant and the like. Forexample, it is possible to operate the radiation source assemblies inrows 210 and 215 at full power while lowering or turning off the powerto the radiation source assemblies in rows 220 and 225. This allows foradvantageous fining tuning of the overall power consumption of the fluidtreatment system (power consumption is usually the single largestoperating expense associated with the fluid treatment system).

Such fine tuning would be difficult to achieve if the sequence of rowsprogressing from an upstream portion of the fluid treatment zone to adownstream portion of the fluid treatment zone (i.e., 210, 220, 215 and225) was the same as the sequence of rows progressing from reactorceiling 205 to reactor floor 240 (i.e., 210, 215, 220 and 225). In thissituation, to modify power consumption, it would be necessary to turnoff entire modules within the fluid treatment zone resulting inrelatively uneven fluid treatment.

With further reference to FIG. 16, it can be seen that the spacing Vbetween rows 210 and 215 is the same as the spacing between rows 220 and225. It can be further seen that the spacing Z between rows 215 and 220is greater that spacing V. In certain cases, it may be desirable forspacing V and spacing Z to be substantially the same.

Still further, there is a spacing T between adjacent modules A, B, C andD. It can be seen that spacing T is greater than spacing V. In certaincases, it may be desirable for spacing V and spacing T to besubstantially the same.

Further, in certain cases, it may be desirable for spacing V, spacing Zand spacing T to be substantially the same.

While this invention has been described with reference to illustrativeembodiments and examples, the description is not intended to beconstrued in a limiting sense. Thus, various modifications of theillustrative embodiments, as well as other embodiments of the invention,will be apparent to persons skilled in the art upon reference to thisdescription. For example, while the illustrated embodiments describedabove with reference to the accompanying drawings relate to a fluidtreatment system comprising a fluid treatment zone having a closedcross-section, it is possible and, in some cases, preferred to implementthe present fluid treatment system with a fluid treatment zone having anopen or other non-closed cross-section (e.g., in an open channel systemsuch as is described in the Maarschalkerweerd #1 Patents referred toabove). Still further, it is possible and, in some cases, preferred toimplement the present fluid treatment system with a fluid treatment zonehaving an semi-enclosed cross-section (e.g., such as is described in theMaarschalkerweerd #2 patents referred to above). Still further, it ispossible and, in some cases, preferred to implement the present fluidtreatment system with a fluid treatment zone that employs so-called“hybrid” radiation source modules (e.g., such as described in UnitedStates patent application publication No. 2002/113021 [Traubenberg etal.] or in International Publication Number WO 04/000,735 [Traubenberget al.]). as stated above, it is possible to incorporate a mechanical orchemical/mechanical cleaning system to remove fouling materials from theexterior of the radiation source assemblies as described variouspublished patent applications and issued patents of Trojan TechnologiesInc. Still further, a variety of conventional sealing systems made of avariety of materials may be used in the present fluid treatment system.The selection of sealing materials and the placement thereof to obtain asufficient seal is not particularly restricted. Still further, it ispossible to modify the illustrated embodiments to use weirs, dams andgates upstream, downstream or both upstream and downstream to optimizefluid flow upstream and downstream of the fluid treatment zone definedin the fluid treatment system of the present invention. Still further,it is possible to modify the illustrated embodiments to include slopedand/or stepped channel surfaces such as is disclosed in InternationalPublication Number WO 01/66469 [Brunet et al.]. Still further, it ispossible, to modify the illustrated embodiments to include mixers ormixing elements on the walls of the channel of the fluid treatmentsystem and/or the radiation source module, for example as taught in oneor more of U.S. Pat. No. 5,846,437 [Whitby et al.], U.S. Pat. No.6,015,229 [Cormack et al.], U.S. Pat. No. 6,126,841 [Whitby et al.],U.S. Pat. No. 6,224,759 [Whitby et al.] and U.S. Pat. No. 6,420,716[Cormack et al.], and in International Publication Number WO 01/93995[Brunet et al.]. Such mixers or mixing elements (sometimes also referredto in the art as “baffles”) can be used to supplement or replace the useof so-called boundary lamps or boundary radiation source assembliesdiscussed above. Still further, it is possible to modify the illustratedembodiments to provide multiple banks of radiation source assemblies inhydraulic series. Still further, it is possible to modify theillustrated embodiments to utilized a radiation source assemblycomprising a plurality of radiation sources disposed in a protectivesleeve (i.e., sometimes referred to in the art as a “lamp bundle”).Still further, it is possible to modify the illustrated embodiments inFIGS. 1 and 2 such that banks 126 and 128 are disposed serially ratherthan in a side-by-side relationship (of course the dimensions of otherelements of the fluid treatment system would need to be modifiedaccordingly). It is therefore contemplated that the appended claims willcover any such modifications or embodiments.

All publications, patents and patent applications referred to herein areincorporated by reference in their entirety to the same extent as ifeach individual publication, patent or patent application wasspecifically and individually indicated to be incorporated by referencein its entirety.

What is claimed is:
 1. A fluid treatment system comprising: an inlet; anoutlet; a fluid treatment zone disposed between the inlet and theoutlet, the fluid treatment zone having disposed therein: (i) anelongate first radiation source assembly having a first longitudinalaxis, and (ii) an elongate second radiation source assembly having asecond longitudinal axis; wherein the first longitudinal axis and thesecond longitudinal axis are non-parallel to each other and to adirection of fluid flow through the fluid treatment zone; wherein thefluid treatment zone has disposed therein an array of radiation sourceassemblies arranged as: (i) a first bank of first radiation sourceassemblies, each first radiation source assembly comprising the elongatefirst radiation source, and (ii) a second bank of second radiationsource assemblies, each second radiation source assembly comprising theelongate second radiation source; wherein the first bank and the secondbank are substantially mirror images of one another along a first planedisposed parallel to the direction of fluid flow through the fluidtreatment zone.
 2. The fluid treatment system defined in claim 1,wherein the fluid treatment system comprises an enclosure having closedcross-section or an open cross-section.
 3. The fluid treatment systemdefined in claim 2, wherein the closed cross-section of the enclosurecomprises a rectilinear shape.
 4. The fluid treatment system defined inclaim 1, wherein the enclosure comprises: (i) a first mounting devicefor substantially fluid tight engagement between a proximal portion ofthe first radiation source assembly and a first wall of the enclosure,and (ii) a second mounting device for substantially fluid tightengagement between a proximal second radiation source assembly and asecond wall of the enclosure.
 5. The fluid treatment system defined inclaim 4, wherein each of the first mounting device and the secondmounting device comprises a sleeve or a radiation source projecting froman exterior surface of the enclosure.
 6. The fluid treatment systemdefined in claim 1, wherein the first radiation source assembly and thesecond radiation source assembly are oriented to define an angle betweenthe first longitudinal axis and the second longitudinal axis in therange of from about 60° about 90°.
 7. The fluid treatment system definedin claim 1, further comprising a support element for supporting a distalportion of the first radiation source assembly and a distal portion ofthe second radiation source assembly.
 8. The fluid treatment systemdefined in claim 7, wherein the support element supports each radiationsource assembly.
 9. The fluid treatment system defined in claim 7,wherein the support element comprises a plate that supports eachradiation source assembly.
 10. The fluid treatment system defined claim7, wherein the support element supports a portion of all radiationsource assemblies present in the fluid treatment system.
 11. The fluidtreatment system defined in claim 7, wherein the support elementcomprises a post disposed substantially orthogonal to the direction offluid flow through fluid treatment zone.
 12. The fluid treatment systemdefined in claim 1, wherein the first radiation source assembly and thesecond radiation source assembly are oriented such that the firstlongitudinal axis and the second longitudinal axis converge toward theinlet at a point downstream of the inlet.
 13. The fluid treatment systemdefined in claim 1, wherein the first bank comprises a plurality offirst radiation source assemblies arranged serially along a length ofthe enclosure.
 14. The fluid treatment system defined in claim 1,wherein the first bank comprises: (i) a plurality of first radiationsource assemblies arranged serially along a length of the enclosure, and(ii) a plurality of first radiation source assemblies arranged seriallyin a direction substantially orthogonal to the direction of fluid flowthrough the fluid treatment zone.
 15. The fluid treatment system definedin claim 1, wherein the second bank comprises: (i) a plurality of secondradiation source assemblies arranged serially along a length of theenclosure, and (ii) a plurality of second radiation source assembliesarranged serially in a direction substantially orthogonal to thedirection of fluid flow through the fluid treatment zone.
 16. The fluidtreatment system defined in claim 1, wherein adjacent pairs of radiationsource assemblies in the first bank and the second bank are in a planarrelationship in a second plane orthogonal to the first plane.
 17. Thefluid treatment system defined in claim 1, wherein the first bank andthe second bank are in a non-planar relationship in a second planeorthogonal to the first plane.
 18. The fluid treatment system defined inclaim 1, further comprising a first transition zone interposed betweenthe inlet and the fluid treatment zone, the first transition zone havinga variable dimension orthogonal to the direction of fluid flow throughthe fluid treatment zone.
 19. The fluid treatment system defined inclaim 18, wherein the variable dimension increases in a direction towardthe fluid treatment zone.
 20. The fluid treatment system defined inclaim 1, further comprising a second transition zone interposed betweenthe fluid zone and the outlet, the second transition zone having avariable dimension orthogonal to the direction of fluid flow through thefluid treatment zone.
 21. The fluid treatment system defined in claim 1,further comprising: (i) a first transition zone interposed between theinlet and the fluid treatment zone, the first transition zone having avariable dimension orthogonal to the direction of fluid flow through thefluid treatment zone, and (ii) a second transition zone interposedbetween the fluid zone and the outlet, the second transition zone havinga variable dimension orthogonal to the direction of fluid flow throughthe fluid treatment zone.